Preparation of Co-Cr films using magnetron sputtering assisted by inductively coupled rf plasma
日本応用磁気学会学術講演概要集 Volume 21
Page 159-
published_at 1997
Title
誘導結合型プラズマ支援マグネトロンスパッタ法によるCo-Cr膜の作成 : 基板バイアスの効果
Preparation of Co-Cr films using magnetron sputtering assisted by inductively coupled rf plasma
Creators
Hayashi T.
Creators
Santoki T.
Creators
Matsuura M.
Languages
jpn
Resource Type
conference paper
Publishers
日本応用磁気学会
Date Issued
1997
Rights
Copyright : 日本応用磁気学会 (The Magnetics Society of Japan)()
File Version
Version of Record
Access Rights
open access
Relations
[ISSN]1340-8100
[NCID]AN10269644
Schools
大学院理工学研究科（工学）