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Co-Cr films prepared by sputtering using electron cyclotron resonance microwave plasma

Journal of applied physics Volume 79 Issue 8 Page 4896-4898
published_at 1996-04-15
2009010218.pdf
[fulltext] 1.04 MB
Title
Co-Cr films prepared by sputtering using electron cyclotron resonance microwave plasma
Creators Yamamoto S.
Creators Sato K.
Creators Kurisu H.
Creators Matsuura M.
Languages eng
Resource Type journal article
Publishers American Institute of Physics
Date Issued 1996-04-15
File Version Version of Record
Access Rights open access
Relations
[ISSN]0021-8979
[NCID]AA00693547
info:doi/10.1063/1.361925
[isVersionOf] [URI]http://jap.aip.org/
Schools 大学院理工学研究科(工学)