Reactive ECR-Sputter-Deposition of Ni-Zn ferrite thin-films for backlayer of PMR media

Reactive ECR-Sputter-Deposition of Ni-Zn ferrite thin-films for backlayer of PMR media

Creators Wada Hirofumi

Creators Yamamoto Setsuo

Creators Kurisu Hiroki

Creators Matsuura Mitsuru

A reactive sputtering method using an Electron-Cyclotron-Resonance (ECR) microwave plasma was used to deposit Ni-Zn ferrite thin-films for a soft magnetic backlayer of Co-containing spinel ferrite thin-film perpendicular magnetic recording (PMR) media. The Ni-Zn spinel ferrite thin-films with a preferential orientation of (100) and a relatively low coercivity of 15 Oe were obtained at a high deposition rate of 14 nm/min and at a temperature below 200 degrees C. Although post-annealing treatment in air at 200 degrees C was effective to decrease the coercivity of the Ni-Zn ferrite thin-films, the saturation magnetization and initial permeability decreased and the surface smoothness was deteriorated simultaneously. The Ni-Zn ferrite thin-films prepared by ECR sputtering are promising as the backlayer of the perpendicular magnetic recording medium, but further improvement is required in terms of the soft magnetic properties, the grain size and the surface roughness.

copyright 2008 IEICE()

[ISSN]0916-8516

[NCID]AA10826283

[isVersionOf] [URI]http://search.ieice.org/index.html