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Magnetic properties of Co-Cr films prepared by sputtering using electron cyclotron resonance microwave plasma

Journal of Magnetics Society of Japan Volume 20 Issue 2 Page 57-60
published_at 1996
Title
ECRスパッタ法により作製したCo-Cr垂直磁気異方性膜の磁気特性
Magnetic properties of Co-Cr films prepared by sputtering using electron cyclotron resonance microwave plasma
Creators 佐藤 王高
Creators Yamamoto Setsuo
Creators Kurisu Hiroki
Creators 松浦 満
Creator Keywords
Co-Cr perpendicular magnetic recording recording media ECR sputtering ion energy
Co-Cr single-layer perpendicular anisotropy films were prepared on polyimide films by sputtering using electron cyclotron resonance (ECR) microwave plasma. The dependence of the crystallographic and magnetic properties of the Co-Cr films on the Ar gas pressure, P_<Ar>, and the target-to-substrate distance, D_<T-S>, was investigated. An 0.09,μm thick Co-Cr film with excellent c-axis orientation?namely, Δθ_<50> of 3.35°?, a high perpendicular magnetic anisotropy field of 4.5 kOe, and a high perpendicular coercivity H_<c⊥> of 1530 Oe was achieved at a relatively high P_<Ar> of 8×10^<-2> Pa and a large D_<T-S> of 230 mm. It may be surmised that ion bombardment with moderate energy in the P_<Ar> and D^<T-S> conditions described above is suitable for the deposition of Co-Cr perpendicular anisotropy films.
Languages jpn
Resource Type journal article
Publishers 日本応用磁気学会
Date Issued 1996
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0285-0192
[NCID]AN0031390X
https://doi.org/10.3379/jmsjmag.20.57
[isVersionOf] [URI]http://www.wdc-jp.com/msj/journal/index.html
Schools 大学院理工学研究科(工学)