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Low-temperature sputter-deposition of Ni-Zn ferrite thin films using electron-cyclotron-resonance microwave plasma

Journal of Magnetics Society of Japan Volume 27 Issue 4 Page 363-366
published_at 2003
Title
反応性ECRスパッタリング法によるNi-Znフェライト薄膜の低温作製
Low-temperature sputter-deposition of Ni-Zn ferrite thin films using electron-cyclotron-resonance microwave plasma
Creators Yamamoto Setsuo
Creators 和田 宏文
Creators Kurisu Hiroki
Creators 松浦 満
Creators 下里 義博
Creator Keywords
Ni-Zn ferrite thin films reactive ECR sputtering high-rate deposition low temperature
A novel sputtering method using an electron-cyclotron-resonance (ECR) microwave plasma was used to perform reactive sputter-deposition of Ni-Zn ferrite thin films. Ni-Zn spinel ferrite thin films with preferential orientation of (400) and relatively low coercivity of 15 Oe were obtained at a high deposition rate of 14 nm/min. and at temperatures lower than 200℃. To achieve this high deposition rate, the configuration of the ECR sputtering apparatus and processing parameters such as the microwave input power, target voltage, and oxygen partial pressure were carefully optimized. Reactive ECR sputtering is one of the most suitable methods for preparation of ferrite thin films applicable to magnetic devices such as MMICs isolators and circulators.
Languages jpn
Resource Type journal article
Publishers 日本応用磁気学会
Date Issued 2003
File Version Not Applicable (or Unknown)
Access Rights metadata only access
Relations
[ISSN]0285-0192
[NCID]AN0031390X
https://doi.org/10.3379/jmsjmag.27.363
[isVersionOf] [URI]http://www.wdc-jp.com/msj/journal/index.html
Schools 大学院理工学研究科(工学)